Plasma enhanced chemical vapor deposition (PECVD) of SiOx thin films on Portuguese limestone: An experimental study

Research demonstrates that plasma-enhanced chemical vapor deposition (PECVD) of SiOx thin films on Portuguese limestone effectively protects stone surfaces without compromising their vapor permeability or increasing hydrophobicity. The study found that these micron-sized films, deposited using tetraethoxysilane (TEOS), provide a strong barrier against acidic solutions, reducing dissolution damage while also inhibiting bio-colonization and soiling. Laboratory tests confirmed the films' durability and protective properties, marking the first successful application of cold plasma deposition for stone conservation at UNESCO World Heritage Sites like the Monastery of Batalha.

Ding, Y., Grassini, S., Angelini, E., & Schiavon, N. (2024). Plasma enhanced chemical vapor deposition (PECVD) of SiOx thin films on Portuguese limestone: An experimental study. Journal of Cultural Heritage, 70, 281–292. https://doi.org/10.1016/j.culher.2024.10.001